Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode-Reference-Cited by-同舟云学术

Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode

Published:2017 Issue:1 Volume:30 Page:87-92
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Niihara Shota¹,Mamezaki Daiki¹,Watanabe Masanori¹,Harada Tetsuo¹,Watanabe Takeo¹

Affiliation:

1. Center for EUV Lithography, LASTI, University of Hyogo

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/1/30_87/_pdf

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5. 5. A. Pirati, R. Peeters, D. Smith, S. Lok, A. Minnaert, M. Noordenburg, J. Mallmann, N. Harned, J. Stoeldraijer, C. Wagner, C. Zoldesi, E. Setten, J. Finders, K. Peuter, C. Ruijter, M. Popadic, R. Huang, M. Lin, F. Chuang, R. Es, M. Beckers, D. Brandt, N. Farrar, A. Schafgans, D. Brown, H. Boom, H. Meiling, and R. Kool, Proc. SPIE, 9422 (2015) 94221P.

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