RESOLUTION AND ETCH RESISTANCE OF A FAMILY OF 193nm POSITIVE RESISTS-Reference-Cited by-同舟云学术

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RESOLUTION AND ETCH RESISTANCE OF A FAMILY OF 193nm POSITIVE RESISTS

Published:1995 Issue:4 Volume:8 Page:623-626
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

ALLEN R.D.,WAN I.Y.,WALLRAFF G.M.,DIPIETRO R.A.,HOFER D.C.,KUNZ R.R.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/8/4/8_4_623/_pdf

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