EUV Resist Outgassing: How Much is Too Much?-Reference-Cited by-同舟云学术

EUV Resist Outgassing: How Much is Too Much?

Published:2007 Issue:3 Volume:20 Page:393-402
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Dean Kim R.,Debeaux Gregory,Wüest Andrea,Garg Rashi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/20/3/20_3_393/_pdf

Reference43 articles.

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2. 2. K.R Dean, I. Nishiyama, H. Oizumi, A. Keen, H. Cao, W. Yueh, T. Watanabe, P. Lacovig, L. Rumiz, G. Denbeaux, J. Simon, "EUV Resist Outgassing Round Robin Results," 2006 EUVL Symposium Poster, October, 2006.

3. 3. K.R Dean, I. Nishiyama, H. Oizumi, A. Keen, H. Cao, W. Yueh, T. Watanabe, P. Lacovig, L. Rumiz, G. Denbeaux, J. Simon, "An analysis of EUV resist outgassing measurements," Proc SPIE, 6519, 65191P 2007.

4. 4. Y. Kakutani, M. Niibe, Y. Gomei, H. Takase, S. Terashima, S. Matsunari, T. Aoki, K. Murakami, and Y. Fukuda, "Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror," Proc. SPIE, 6151, 61510H, 2006.

5. 5. A. Keen, R. Grant, R. Lambert, M. Tihov, G. Kyriakou, D. Davis, "Contamination Control in The Projection Optics Environment," 5th EUVL Symposium, October 15-18, 2006.

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