1. 1. “World of Photochemistry”, Katsumi Tokumaru, Dainippon Tosho, Tokyo, Japan.
2. 2. “Development of new practical polymeric materials for photo-resist”, Ed. Tsuguo Yamaoka, CMC, Tokyo, Japan
3. 3. “Fine Processing Technology” [Basic Part], ed. by Polymer Society Japan, NTS, Tokyo, Japan
4. 4. “Photopolymer for Surface Treatment”, Yasuyuki Takimoto, Bunshin-Publishing Co. Tokyo.
5. 5. Richard John Ellis and Denis Edward Vogel, Minnesota Mining and Manufacturing Co., JP-H7-186562,