t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies.-Reference-Cited by-同舟云学术

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t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies.

Published:1993 Issue:4 Volume:6 Page:457-472
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Nalamasu Omakaram,Novembre Anthony E.,Kometani Janet M.,Hanson James E.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/6/4/6_4_457/_pdf

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of photoresists for ArF-excimer laser lithography using monoenergetic positron beams;Journal of Polymer Science Part B: Polymer Physics;2003

2. A unified approach to resists materials design for the advanced lithographic technologies;Microelectronic Engineering;1995-02

3. Synthesis and polymerization of t-BOC protected maleimide monomers: N-(t-butyloxycarbonyloxy)maleimide and N-[p-(t-butyloxycarbonyloxy)phenyl]-maleimide;Polymer;1995-01

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