Deep UV photoresists: Photospeed, resolution, and environmental stability tradeoffs.-Reference-Cited by-同舟云学术

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Deep UV photoresists: Photospeed, resolution, and environmental stability tradeoffs.

Published:1993 Issue:4 Volume:6 Page:645-656
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Thackeray James W.,Adams Timothy,Fedynyshyn Theodore H.,Georger Jacque,Hemond Richard,Medeiros David,Mori J. Michael,Orsula George W.,Sinta Roger F.,Small Richard D.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/6/4/6_4_645/_pdf

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Resolution capability of resist patterns and throughput using alkaline treatment under ultrasonic irradiation;Japanese Journal of Applied Physics;2022-01-21

2. Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist;Journal of Polymer Research;2017-10-30

3. The effect of diffusion, reaction order, and developer selectivity on the performance of positive DUV resists;Microelectronic Engineering;1994-01

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