Multi-layer Resist Process Using Top-layer Resist as Phase Shifters-Reference-Cited by-同舟云学术

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Multi-layer Resist Process Using Top-layer Resist as Phase Shifters

Published:2005 Issue:3 Volume:18 Page:443-448
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Horiuchi Toshiyuki¹,Suzuki Yoshitaka¹,Usui Kumiko¹,Yoshida Toshikazu¹

Affiliation:

1. Tokyo Denki University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/18/3/18_3_443/_pdf

Reference13 articles.

1. 1. International Technology Roadmap for Semiconductors, 2004 Edition, Lithography, http//public.itrs.net/Files/2004ITRS/Home200 4.htm.

2. 2. S. Suzuki, T. Shiomi and T. Horiuchi, Dig. JSPE Spring Meeting (2003) 117, in Japanese.

3. 3. S. Suzuki and T. Horiuchi, Ext. Abs.JSAP 51^st Spring Meeting, (2004) 778, in Japanese.

4. 4. S. Suzuki and T. Horiuchi, Ext. Abs. JSAP 65^th Autumn Meeting, (2004) 618, in Japanese.

5. 5. T. Horiuchi and T. Narita, Jpn. J. Appl. Phys. 40 (2001) 407.

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