Effects of Modified Materials on Plasma in Surface Modification by CF<sub>4</sub> Plasma-Reference-Cited by-同舟云学术

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Effects of Modified Materials on Plasma in Surface Modification by CF₄ Plasma

Published:2004 Issue:2 Volume:17 Page:177-178
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Katoh Masaaki¹,Shirai Masami¹,Ohte Takeo¹,Kojima Akira¹

Affiliation:

1. Gunma National College of Technology

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/17/2/17_2_177/_pdf

Reference8 articles.

1. [1] M. Hudis, in: J.R. Hollahan, A.T. Bell (Eds.), Techniques and Applications of Plasma Chemistry, Wiley, New York, 1974, p.113.

2. [2] B. N. Chapman, Glow Discharge Processes, Wiley, New York, 1980, p.177.

3. [3] O. Nomura, Purazuma Kagaku, (Nipon kougyo sinbunsya, Tokyo) 1984, p.40-41 (in japanese).

4. [4] Y. Osada, Teion Purazuma Zairyoukagaku, Sangyou Tosho, Tokyo, 1994, pp.191-199 (in Japanese).

5. [5] M. Katoh, K. Miyashita, T. Ohte, M. Kaneko, S. Ohtani, A. Kojima, J. Photopolym. Sci. Technol. 8 (1995) 411-419.

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1. Surface modification of poly (vinyl chloride) by long-distance and direct argon RF plasma;Chinese Science Bulletin;2006-03

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