Author:
Utsumi Yoshiyuki,Komoro Yoshitaka,Kawaue Akira,Seshimo Takehiro,Hada Hideo,Nakamura Tsuyoshi,Yoshii Yasuhiro,Onodera Junichi,Ogawa Satoshi
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference10 articles.
1. Resist component leaching in 193-nm immersion lithography
2. 2. M. Sato, "TOK Resist & Material Development Status for Immersion Lithography", Litho Forum in Los Angeles, January, 2004.
3. Development Status of High Performance Materials for Immersion Lithography
4. 4. H. Nakagawa, K. Hoshiko, M. Shima, S. Kusumoto and T. Shimokawa et. al., Proc. SPIE, 6153, 61530D (2006).
5. Study and control of the interfacial mass transfer of resist components in 193-nm immersion lithography
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献