An Evaluation of Ion Implantation for LWR Improvement in EUV Lithography-Reference-Cited by-同舟云学术

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An Evaluation of Ion Implantation for LWR Improvement in EUV Lithography

Published:2011 Issue:2 Volume:24 Page:173-178
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kikuchi Yukiko

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/24/2/24_2_173/_pdf

Reference11 articles.

1. EUV Lithography Development and Research Challenges for the 22 nm Half-pitch

2. 2. P. P. Naulleau, et al., Proc. SPIE, 7271 (2009) 72710W.

3. 3. C. Koh, et al., Proc. SPIE, 7636 (2010) 763604.

4. 4. P. P. Naulleau, et al., 2010 EUVL Symposium, ET-06.

5. 5. R. Caudillo, M. Chandhok, G. M. Kloster, E. S. Putna, U. Shah and R. Younkin, 2009 EUVL Symposium, O_RI-03.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Directed Self Assembly Materials for Hole Patterning;Journal of Photopolymer Science and Technology;2012

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