1. 1.a) R. Dammel, "Diazonaphthoquinone-Based Resists", SPIE Tutorial Texts TT11, SPIE Optical Engineering Press, Bellingham, WA 1993, 231 + IX pages, ISBN 0-8194-1019-5.
2. b) W.R. Brunsvold, N.K. Eib, C.F. Lyons, W. Montgomery, M. Plat, R. Dammel, O.E. Evans, M.D. Rahman, S. Jain, and P. Lu, "Novel DNQ-PACs for High-Resolution i-Line Lithography", Proc. SPIE 1672, 273-285 (1992).
3. c) R. Dammel and A. Reiser, "Recent Developments in the Dissolution of Novolak-Based Resists", Polym. Mater. Sci. Eng. 68, 49-51 (1993).
4. 2.a) A. Menschig, A. Forchel, R. Dammel, J. Lingnau, U. Scheunemann, J. Theis, and S. Pongratz, "High Sensitivity Positive-Tone Resist RAY-PF - Performance under E-Beam Exposure", Microelectronic Engineering, 9, 571-574 (1989).
5. b) R. Dammel, K.F. D?ssel, J. Lingnau, J. Theis, H.L. Huber, H. Oertel, and J. Trube, "Negative-Tone High-Resolution Photoresist for X-Ray Lithography", Microelectronic Engineering, 9, 575-578 (1988).