Metal Liftoff Process using Solvent Soluble Resist by UV-NIL-Reference-Cited by-同舟云学术

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Metal Liftoff Process using Solvent Soluble Resist by UV-NIL

Published:2010 Issue:1 Volume:23 Page:87-90
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Nishino Tomoki,Fujii Noriyoshi,Miyake Hiroto,Yukawa Takao,Sakamoto Junji,Suzuki Ryosuke,Kawata Hiroaki,Hirai Yoshihiko

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/23/1/23_1_87/_pdf

Reference10 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Fabrication of Anti-reflective Structure by Nano Casting Method

3. 3. T. Yoshikawa, T. Konishi, M. Nakajima, H.Kikuta, H. Kawata, and Y. Hirai, J. Vac. Sci. Technol. B 23(2005) 2939.

4. Fine pattern fabrication on glass surface by imprint lithography

5. 5. for example, H. Atwater, Scientific American (April 2007) 56.

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