Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference6 articles.
1. [1] 2009 International Technology Roadmap for Semiconductors
2. Polymer Imprint Lithography with Molecular-Scale Resolution
3. [3] T. Higashiki, "Challenges to Next Generation Lithography," Semicon Japan presentation, 2009.
4. [4] S. Sasaki, T. Hiraka, J. Mizuochi, Y. Nakanishi, S. Yusa, Y. Morikawa, H. Mohri, N. Hayashi, "UV NIL template making and imprint evaluation, " in Proc. SPIE, 7271 ( 2009).
5. [5] G. Hughes, L. Litt, A. Wuest, S. Palaiyanur, "Mask and Wafer Cost of Ownership (CoO) from 65 to 22nm Half-Pitch Nodes", Proc. SPIE, 7028 ( 2008).
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