Capabilities and Limitations of Plasma Polymerized Methylsilane (PPMS) All-Dry Lithography.-Reference-Cited by-同舟云学术

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Capabilities and Limitations of Plasma Polymerized Methylsilane (PPMS) All-Dry Lithography.

Published:1998 Issue:4 Volume:11 Page:651-661
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Dabbagh Gary,Hutton Richard S.,Cirelli Raymond A.,Novembre Anthony E.,Reichmanis Elsa,Nalamasu Omkaram

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/11/4/11_4_651/_pdf

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of advanced silylation process for 157-nm lithography;Microelectronic Engineering;2001-09

2. Plasma polymerized methylsilane I: Characterization of thin photosensitive films for advanced lithography applications;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

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