Single layer resists with enhanced etch resistance for 193 nm lithography.-Reference-Cited by-同舟云学术

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Single layer resists with enhanced etch resistance for 193 nm lithography.

Published:1994 Issue:3 Volume:7 Page:507-516
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

ALLEN ROBERT D.,WALLRAFF GREGORY M.,DIPIETRO RICHARD A.,HOFER DONALD C.,KUNZ RODERICK R.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/7/3/7_3_507/_pdf

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