Understanding of Strategic Design of Resist Formulation Through Studying of Quencher-Functional Component and Those Contributions to High Resolution Patterning-Reference-Cited by-同舟云学术

Understanding of Strategic Design of Resist Formulation Through Studying of Quencher-Functional Component and Those Contributions to High Resolution Patterning

Published:2019-06-24 Issue:2 Volume:32 Page:361-366
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Lee Choong-Bong¹,Park James¹,Cutler Charlotte¹,DeSisto Jason¹,Rena Rochelle¹,Marangoni Tomas¹,Aqad Emad¹,Thackeray James W.¹

Affiliation:

1. Dupont Electronics and Imaging

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/32/2/32_361/_pdf

Reference6 articles.

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2. 2. C. A. Mack, Proc. SPIE, 10450 (2017) 104500P.

3. 3. D. S.-H. Hsu, W.-H. Hsieh, C.-Y. Huang, W.-B. Wu, and C.-L. Shih, Proc. SPIE, 8325 (2012) 83251M.

4. 4. Y. Utsumi, T. Seshimo, Y. Komuro, A. Kawaue, K. Ishiduka, K. Matsuzawa, H. Hada, and J. Onodera, Jpn. J. Appl. Phys., 48 (2009) 06FC07.

5. 5. K. Matsunaga, T. Oori, H. Kato, D. Kawamura, E. Shiobara, Y. Inatomi, T. Kawasaki, M. Iwashita, and S. Ito, Proc. SPIE, 6923 (2008) 69231E.

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