Surface imaging process using germylation for deep UV lithography.-Reference-Cited by-同舟云学术

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Surface imaging process using germylation for deep UV lithography.

Published:1991 Issue:3 Volume:4 Page:497-507
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yoshida Yasuhiro,Fujioka Hirofumi,Nakajima Hiroyuki,Kishimura Shinji,Nagata Hitoshi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/4/3/4_3_497/_pdf

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Poly(ferrocenyldimethylsilanes) for Reactive Ion Etch Barrier Applications;Chemistry of Materials;2001-02-01

2. The investigation of the germanium distribution for the optimization of the surface reaction process;Thin Solid Films;1997-04

3. Resists for microlithography: Present status and recent research trends;Progress in Polymer Science;1992-01

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