Affiliation:
1. Tokyo University of Science
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference3 articles.
1. 1. S. Fujimori and M. Kondo, "Method of mask fabrication", Japan Patent 947244 (applied in 1975 and registered in 1979), Japan Patent Office.
2. 3. S. Fujimori, "Fine pattern fabrication by the molded mask method (Nanoim-print lithography) in the 1970s," Jpn. J. Appl. Phys., 48 (2009) 849.
3. 4. S. Fujimori, "The molded mask method: The origin of nanoimprint li-thography," J. Photopolym. Sci. Technol., 29 (2016) 849.