Development of High-Performance Negative-tone Resists for 193-nm Lithography
Author:
Affiliation:
1. Central Research Laboratory, Hitachi Ltd.
2. Current address: Toyama Industrial Technology Center, The Central Research Institute
3. Hitachi ULSI Systems Co. Ltd.
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/16/4/16_4_489/_pdf
Reference28 articles.
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3. 3. X. Shi, A. Fung, Z. Li, T. Nguyen, R. Socha, W. Conley, and M. Dussa, Proc. SPIE, 3999 (2000) 835.
4. 4. M.D. Levenson, N.S. Viswanathan, and R.A Simpson, IEEE Trans. Electron Devices, ED-29 (1982) 1828.
5. 5. T. Terasawa, N. Hasegawa, T. Kurosaki, and T. Tanaka, Proc. SPIE, 1088 (1989) 25.
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