Synthesis of i- and g-Line Sensitive Photoacid Generators and Their Application to Photopolymer Systems-Reference-Cited by-同舟云学术

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Synthesis of i- and g-Line Sensitive Photoacid Generators and Their Application to Photopolymer Systems

Published:2003 Issue:1 Volume:16 Page:91-96
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Iwashima Chiaki,Imai Genji,Okamura Haruyuki,Tsunooka Masahiro,Shirai Masamitsu

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/16/1/16_1_91/_pdf

Reference12 articles.

1. Photoacid and Photobase Generators: Prospects and Their Use in the Development of Polymeric Photosensitive Systems

2. Synthesis, characterization, and lithography of α-substituted 2-nitrobenzyl arylsulfonate photo-acid generators with improved resistance to post-exposure bake

3. Photogenerated acid-catalyzed formation of phosphonic/phosphoric acids by deprotection of esters

4. Photoinitiated cationic polymerization by triarylselenonium salts

5. Dye-sensitized photoinitiated cationic polymerization. The system: Perylene–triarylsulfonium salts

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2. Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability;Journal of Photopolymer Science and Technology;2022-12-16

3. Arylazo Sulfones as Nonionic Visible-Light Photoacid Generators;The Journal of Organic Chemistry;2022-07-22

4. Anionic, Photoacid, and Photobase Initiating Systems;Photoinitiators;2021-04-05

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