Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask-Reference-Cited by-同舟云学术

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Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask

Published:2021-06-11 Issue:2 Volume:34 Page:123-126
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Osumi Tomoaki¹,Misaka Akio¹,Sato Kousuke¹,Yasuda Masaaki¹,Sasago Masaru¹,Hirai Yoshihiko¹

Affiliation:

1. Physics and Electronics Engineering, Graduate School of Engineering, Osaka Prefecture University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/34/2/34_123/_pdf

Reference21 articles.

1. 1. M. Mao, J. He, X. Li, B. Zhang, Q. Lei, Y. Liu, and D. Li, Adv. Micromachines, 8 (2017) 113.

2. 2. R. Farahani, M. Dubé, and D. Therriault, Adv. Mater., 28 (2016) 5794.

3. 3. W. Xiong, Y. Zhou, W. Hou, L. Jiang, M. Mahjouri-Samani, J. Park, X. He, Y. Gao, L. Fan, T. Baldacchini, J. Silvain, and Y. Lu, Front. Optoelectron., 8 (2015) 351.

4. 4. R. Kankala, K. Zhu, J. Li, C. Wang, S. Wang, and A. Chen, Biofabrication, 9 (2017) 032002.

5. 5. F. Sima, J. Xu, D. Wu, and K. Sugioka, Micromachines, 8 (2017) 40.

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