Minute Tunnel Structure Formation with Permanent Film Photoresist-Reference-Cited by-同舟云学术

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Minute Tunnel Structure Formation with Permanent Film Photoresist

Published:2006 Issue:1 Volume:19 Page:57-62
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Misumi Koichi,Saito Koji,Yamanouchi Atsushi,Senzaki Takahiro,Honma Hideo

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/19/1/19_1_57/_pdf

Reference4 articles.

1. 1. Y. Washio, T. Senzaki, Y. Masuda, K. Saito, H. Obiya. : Proceeding of the SPIE, Vol. 5753 (2005) p.p. 957-967.

2. 2. M. Takeda, Electronics Mounting Society Magazines Vol.7, No.2 (2004) p.p. 130-135.

3. 3. K. Takahashi, Electrode Contact Technology of COC (2004) p.p. 116-122.

4. 4. Wei and Joshi, IEEE CPMT, Vol. 26 (2003) p.p. 55-61.

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