1. N. Munter, B. Kolbeson, W. Storm, and T. Muller ,Proceedings of UCPSS, p. 91, Oostende, Belgium (2000).
2. Development of Ammonia Adsorption Filter and Its Application to LSI Manufacturing Environment
3. W. A. Syverson and P. J. Schbring , inProceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, J. Ruzylle , Editor, PV 92-12, The Electrochemical Society Proceedings Series, Pennington, NJ (1992).
4. Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
5. L. W. Shive, R. Blank, and K. Lamb , MICRO, 2001, 59 (March).