Vertically Integrated ZRAM toward Extremely Scaled Memory

Abstract

This paper discusses the demonstration of a vertically integrated gate-all-around (GAA) silicon nanowire (SiNW) channel-based dynamic random access memory (DRAM) without a cell-capacitor as a breakthrough for conventional DRAM scaling. Owing to the one-route all-dry etching process (ORADEP) with stiction-free stability and process simplicity, vertical integration of multiple silicon nanowire was achieved with high uniformity and high reproducibility. Finally, high performance suitable for further scaling was presented in zero-capacitor DRAM (ZRAM) operable with up to five-story SiNW channels without sacrificing scalability.