The Kinetics of the Low‐Pressure Chemical Vapor Deposition of Polycrystalline Silicon from Silane-Reference-Cited by-同舟云学术

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The Kinetics of the Low‐Pressure Chemical Vapor Deposition of Polycrystalline Silicon from Silane

Published:1998-04-01 Issue:4 Volume:145 Page:1318-1330
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Weerts W. L. M.¹,de Croon M. H. J. M.¹,Marin G. B.¹

Affiliation:

1. Laboratorium voor Chemische Technologie, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1838458/pdf

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