Fluorescence Correlation Spectroscopic Studies of Particle Properties for Colloidal Ceria Abrasives Used in Chemical-Mechanical Planarization
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Published:2016-07-28
Issue:18
Volume:72
Page:43-51
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ISSN:1938-5862
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Container-title:ECS Transactions
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language:
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Short-container-title:ECS Trans.
Author:
Schorr Donald K.,Smith Madison A.,Rawat Ashwani K.,Carver Colin T.,Mansour Moinpour,Remsen Edward E.
Abstract
The application of fluorescence correlation spectroscopy (FCS) in the characterization of ceria abrasives used in chemical-mechanical planarization (CMP) slurries is described. A fluorescent dye, Rhodamine 110 (R110), is used for this purpose. R110 adsorption on ceria particles is found to be pH-dependent and colloidal ceria dispersions differing in mean hydrodynamic diameter are analyzed. A Langmuir isotherm is generated for R110 adsorption on ceria, and the magnitude of the Langmuir constant is found to be four-times smaller than the corresponding constant for R110 adsorption on colloidal silica CMP abrasives. R110-labeled ceria particles are generated to quantitatively determine the particle size distribution (PSD) of abrasive ceria dispersions. The Maximum Entropy Method is used reduce the FCS autocorrelation function of R110-labeled ceria particle dispersions thereby producing a PSD. These findings indicate that ceria size distributions containing particles as small as 5 to 10 nm in diameter can be readily characterized using FCS.
Publisher
The Electrochemical Society