Abstract
The effect of deposition time (film thickness) and deposition current density (growth rate) on the kinetic roughening of the films were studied using atomic force microscopy (AFM) and roughness calculation. Our films were electrodeposited on Au/Cr/ glass substrates, under galvanostatic control (constant current density), from a single electrolyte containing Pt4+ ions. The data is consistent with a rather complex behaviour known as "anomalous scaling" where both local and large scale roughnesses show power law dependence on the film thickness.
Publisher
The Electrochemical Society