Radiation‐Induced Reactions of Chloromethylstyrene‐Based Resist Materials Analyzed from Radiolysis of Low Molecular Model Compounds-Reference-Cited by-同舟云学术

Radiation‐Induced Reactions of Chloromethylstyrene‐Based Resist Materials Analyzed from Radiolysis of Low Molecular Model Compounds

Published:1985-07-01 Issue:7 Volume:132 Page:1678-1683
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Tanigaki Katsumi¹²,Suzuki Masayoshi¹²,Saotome Yasushi¹²,Ohnishi Yoshitake¹²,Tateishi Kazuo¹²

Affiliation:

1. NEC Corporation, Fundamental Research Laboratories, Miyamae‐ku, Kawasaki City 213, Japan

2. NEC Corporation, Resources and Environment Protection Research Laboratories, Miyamae‐ku, Kawasaki‐City 213, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2114190/pdf

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