Vanadyl Precursors Used to Modify the Properties of Vanadium Oxide Thin Films Obtained by Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Vanadyl Precursors Used to Modify the Properties of Vanadium Oxide Thin Films Obtained by Chemical Vapor Deposition

Published:1999-02-01 Issue:2 Volume:146 Page:551-558
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Barreca Davide¹,Depero Laura E.²,Franzato Enrico¹,Rizzi Gian Andrea¹,Sangaletti Luigi²,Tondello Eugenio¹,Vettori Umberto¹

Affiliation:

1. Centro di Studio sulla Stabilitàe Reattività dei Composti di Coordinazione del CNR, Dipartimento di Chimica Inorganica, Metallorganica ed Analitica, Università di Padova, I-35131 Padova, Italy

2. Dipartimento di Chimica e Fisica per i Materiali, Università di Brescia, I-25123 Brescia, Italy

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1391642/pdf

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