Author:
Kang S. K.,Min B. G.,Ko D.-H.,Kang H. B.,Yang C. W.,Lim K. Y.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. C.-C. Chen, H.-C. Lin, C.-Y. Chang, T.-S. Chao, S.-C. Huang, W.-F. Wu, T.-Y. Huang, and M.-S. Liang, inProceedings of the 5th Internaional Symposium on Plasma Process-Induced Damage, p. 117 (2000).
2. H. N. Chua, K. L. Pey, S. Y. Siah, L. Y. Ong, E. H. Lim, C. L. Gan, K. H. See, and C. S. Ho, inProceedings of the 7th International Symposium Physical and Failure Analysis of Integrated Circuits, p. 44 (1999).
3. Thermal stability of CoSi/sub 2/ film for CMOS salicide
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献