Author:
Poon Chyiu Hyia,Tan Leng Seow,Cho Byung Jin,See Alex,Bhat Mousumi
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon
2. Transient enhanced diffusion after laser thermal processing of ion implanted silicon
3. Thermodynamic and kinetic studies of laser thermal processing of heavily boron-doped amorphous silicon using molecular dynamics
4. K. S. Jones, E. Kuryliw, R. Murto, M. Rendon, and S. Talwar, inProceedings of the International Conference on Ion Implantation Technology, p. 111 (2000).
5. S. Wolf and R. N. Tauber,Silicon Processing for the VLSI Era: Process Technology, p. 129, Lattice Press, Sunset Beach, CA (2000).
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17 articles.
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