Chemomechanical Polishing and Etching of GaAs : In and GaAs in Aqueous Solutions of NaOCl-Reference-Cited by-同舟云学术

Chemomechanical Polishing and Etching of GaAs : In and GaAs in Aqueous Solutions of NaOCl

Published:1987-07-01 Issue:7 Volume:134 Page:1859-1862
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Khoukh A.¹²,Krawczyk S. K.¹²,Olier R.¹²,Chabli A.¹²,Molva E.¹²

Affiliation:

1. Laboratoire d'Electronique, Automatique et Mesures Electriques (UA CNRS 848), and Laboratoire de Physico‐Chimie des Interfaces (UA CNRS 404), Ecole Centrale de Lyon, 69131 Ecully Cedex, France

2. Laboratoire d'Electronique et de Technologie de l'Informatique (LETI), Institut de Recherche Technologique et de Développement Industriel (IRDI), Ceng, 38041 Grenoble Cedex, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2100770/pdf

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