Deposition Process of Amorphous Boron Carbide from CH[sub 4]∕BCl[sub 3]∕H[sub 2] Precursor-Reference-Cited by-同舟云学术

Deposition Process of Amorphous Boron Carbide from CH[sub 4]∕BCl[sub 3]∕H[sub 2] Precursor

Published:2006 Issue:12 Volume:153 Page:C795
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Berjonneau J.,Chollon G.,Langlais F.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Chemical vapor deposition of boron carbide

2. M. Ducarroir and C. Bernard , inProceedings of the 5th International Conference on CVD, J. M. Blocher, H. E. Hintermann, and L. H. Hall, Editors, p. 72, The Electrochemical Society Proceedings Series, Pennington, NJ (1975).

3. Étude expérimentale du dépôt chimique du carbure de bore à partir de mélanges trichlorure de bore, méthane et hydrogène

4. Theoretical and experimental studies on the chemical vapor deposition of boron carbide

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