Epitaxial Growth of Iron-Silicide Nanodots on Si Substrates Using Ultrathin SiO2 Film Technique and Their Physical Properties
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Published:2013-03-15
Issue:6
Volume:50
Page:65-70
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ISSN:1938-6737
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Container-title:ECS Transactions
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language:en
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Short-container-title:ECS Transactions
Author:
Nakamura Y.,Ichikawa M.
Publisher
The Electrochemical Society