Author:
Choi Chel-Jong,Jung Won-Jin,Kim Yark-Yeon,Jun Myung-Sim,Kim Tae-Youb,Jang Moon-Gyu,Song Myeong-Ho,Lee Seong-Jae
Publisher
The Electrochemical Society
Subject
Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering
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3. High-k gate stacks for planar, scaled CMOS integrated circuits
4. Thermally Robust HfN Metal as a Promising Gate Electrode for Advanced MOS Device Applications
5. Fermi-Level Pinning at the Polysilicon/Metal Oxide Interface—Part I