Author:
You Hsin-Chiang,Ko Fu-Hsiang,Lei Tan-Fu
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference20 articles.
1. Electrical characterization and material evaluation of zirconium oxynitride gate dielectric in TaN-gated NMOSFETs with high-temperature forming gas annealing
2. W. J. Qi, R. Nieh, B. H. Lee, K. Onishi, L. Kang, Y. Jeon, J. C. Lee, V. Kaushik, B. Y. Neuyen, L. Prabhu, K. Eisenbeiser, and J. Finder ,VLSI Technical Digest, p. 40 (2000).
Cited by
20 articles.
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