Affiliation:
1. Department of Chemical Engineering, University of California, Berkeley, California 94720
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
31 articles.
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1. Metallization;Handbook of Semiconductor Interconnection Technology, Second Edition;2006-02-22
2. Semiempirical profile simulation of aluminum etching in a Cl2/BCl3 plasma;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-09
3. Etching of high-kdielectric Zr1−xAlxOy films in chlorine-containing plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-07
4. Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memory;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-07
5. CF4 Plasma Etching of Ta−Al Alloy Thin Films;Materials Science and Engineering Serving Society;1998