Author:
Smith Nigel P.,Dasari Prasad,Li Jie
Abstract
We report scatterometry overlay measurements data from a set of twelve test wafers, using four different target designs. The TMU of these measurements is under 0.4nm, within the process control requirements for the 22nm node. Comparing the measurement differences between targets and with image-based overlay data indicates the presence of systematic and random measurement errors that exceed the TMU estimate.
Publisher
The Electrochemical Society
Cited by
1 articles.
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