Reduced Pressure Etching of Thermal Oxides in Anhydrous HF / Alcoholic Gas Mixtures-Reference-Cited by-同舟云学术

Reduced Pressure Etching of Thermal Oxides in Anhydrous HF / Alcoholic Gas Mixtures

Published:1995-04-01 Issue:4 Volume:142 Page:1322-1326
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Torek Kevin¹²,Ruzyllo Jerzy¹²,Grant Robert¹²,Novak Richard¹²

Affiliation:

1. Electronic Materials and Processing Research Laboratory, The Pennsylvania State University, University Park, Pennsylvania 16802

2. SubMicron Systems, Incorporated, Allentown, Pennsylvania 15106

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2044171/pdf

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