Work Function Estimation of Gallium-Doped Zinc Oxide Using Transparent Gate Electrode MOSFET

Abstract

In this research, the work function (WF) of RF sputtered GZO thin films has been estimated using the electrical characteristics n-Metal Oxide Semiconductor Field Effect Transistor (n-MOSFET) device. Two identical sets of MOSFETs were fabricated in this work using a four-level mask. These MOSFETs have two different types of gate contact materials (Al and GZO respectively). GZO was deposited by using RF magnetron sputtering technique while Al was deposited using the thermal evaporation technique. By comparison of the work function of the two MOSFETs, the work function of RF sputtered GZO thin films was identified to be around 4.58 eV.