Application of InP Quantum Dot film by Photolithography Technology on a Micro-LED Display

Abstract

The technical of realizing full-color display by monochromatic integrated 100 × 100 blue Micro-LED array exciting InP quantum dot color conversion layer is researched in this study. Using photolithography technology to prepare color film on a separate glass cover glass has the advantages of better accuracy and display resolution. The optimum thickness 12 μm of the quantum dot photoresist (QDPR) was verified and 10 μm black matrix (BM) was proposed to reduce the light crosstalk between different sub-pixels. The thickness of color filter 1 ± 0.4 μm was made successfully between the QDPR and the cover glass, which can greatly can significantly increase the display color gamut from 78.7% to 100.8% NTSC. The red and green brightness conversion efficiency reach up to 78.1% and 296.5% respectively. Representative RGB monochromatic pictures with 100% high yield were displayed successfully.