Experimental and Modelling Investigation of Re-Adhesion Mechanism of Detached Nanoparticles to Wafer Surface in Spin Rinse Process
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/2162-8777/ab9fe9/pdf
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1. A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process
2. Effect of friction on CMP in-situ brush cleaning: CFM: Contamination free manufacturing
3. PVA Brush Technology for Next Generation Post-CMP Cleaning Applications
4. Light scattering model for individual sub-100-nm particle size determination in an evanescent field
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