Surface Charge Analysis of Ultrathin HfO[sub 2], SiO[sub 2], and Si[sub 3]N[sub 4]-Reference-Cited by-同舟云学术

Surface Charge Analysis of Ultrathin HfO[sub 2], SiO[sub 2], and Si[sub 3]N[sub 4]

Published:2004 Issue:2 Volume:151 Page:H44
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Takeuchi Hideki,King Tsu-Jae

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference25 articles.

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