Dissociative Mechanisms of Monosilane and Arsine on Copper(II) Oxide-Reference-Cited by-同舟云学术

Dissociative Mechanisms of Monosilane and Arsine on Copper(II) Oxide

Published:1996-08-01 Issue:8 Volume:143 Page:2654-2657
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Watanabe Tadaharu¹²³,Imai Hiroaki¹²³,Suzuki Takashi¹²³

Affiliation:

1. Nippon Sanso Corporation, Electronic Business Division, Yamanashi Laboratory, 3054‐3 Shimokurosawa, Takane‐cho, Kitakoma‐gun, Yamanashi 408, Japan

2. Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3‐14‐1 Hiyoshi, Kohoku, Yokohama 223, Japan

3. Department of Applied Chemistry and Biotechnology, Faculty of Engineering, Yamanashi University, 1 Takeda, Kofu‐shi, Yamanashi 400, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1837064/pdf

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