Author:
Yoshimoto Masahiro,Okutani Masashi,Murai Gota,Tagawa Shuji,Saikusa Hiroki,Takashima Shuhei,Yoo Woo Sik
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference44 articles.
1. Electrical activation of ultra-shallow B and BF2 implanted silicon by flash anneal
2. Suguro K. Ito T. Nishinohara K. Matsuo K. Iinuma T. Itokawa H. Kawase Y. , Electrochem. Soc. Proc. Ser. PV 2004-01, p. 39.
3. Hebb J. Wang Y. Chen S. Shen M. Zhou S. Wang X. Owen D. , Proc. 17th IEEE Int. Conf. Advanced Thermal Processing of Semiconductors, RTP 2009, p. 17.
4. Quantitative prediction of junction leakage in bulk-technology CMOS devices
5. Micro-uniformity during laser anneal : metrology and physics
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献