Fabrication of Coatings with Targeted Tunable Electrical Properties via ALD: Al2O3/ZnO and Nb2O5/Ta2O5

Abstract

Conformal deposition of multi-component materials by atomic layer deposition makes it ideally suited to for use in semiconductor and MEMS devices which require precisely tuned material properties. As has been reported previously, we observe that resistivity of two component films Al2O3/ZnO and Nb2O5/Ta2O5 can be tuned to over a large range. However, we find that the electrical response of these materials change when subjected to sustained electrical field in air.