Metallorganic Chemical Vapor Deposition of Ru and RuO[sub 2] Using Ruthenocene Precursor and Oxygen Gas-Reference-Cited by-同舟云学术

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Metallorganic Chemical Vapor Deposition of Ru and RuO[sub 2] Using Ruthenocene Precursor and Oxygen Gas

Published:2000 Issue:1 Volume:147 Page:203
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Park Sung-Eon,Kim Hyun-Mi,Kim Ki-Bum,Min Seok-Hong

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Cited by 48 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metallic nanofilms on Si(100) and SiO₂ grown with a ruthenium precursor;Japanese Journal of Applied Physics;2024-08-01

2. Orientation Control and Mosaicity in Heteroepitaxial RuO₂ Thin Films Grown through Reactive Direct Current Sputtering;Crystal Growth & Design;2024-05-16

3. Transition Metal Oxide-Based Nanomaterials for Advanced Energy Storage;Emerging Nanodielectric Materials for Energy Storage;2023-10-31

4. Infrared Matrix-Isolation and Theoretical Study of the Reactions of Ruthenocene with Ozone;The Journal of Physical Chemistry A;2019-05-31

5. Conformal Deposition of RuO2 on Cu via a Galvanic Cementation Reaction;Journal of The Electrochemical Society;2019

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