Electron Microscopy of Electrolytically Etched Silicon Surfaces-Reference-Cited by-同舟云学术

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Electron Microscopy of Electrolytically Etched Silicon Surfaces

Published:1973 Issue:1 Volume:120 Page:142
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Hill M. J.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Porous Silicon Formation in N−/N+/N− Doped Structures;Journal of The Electrochemical Society;1991-06-01

2. Jet and Laser‐Jet Electrochemical Micromachining of Nickel and Steel;Journal of The Electrochemical Society;1989-08-01

3. Microstructure of pores in N+-silicon layers;Proceedings, annual meeting, Electron Microscopy Society of America;1987-08

4. Pulsed‐jet etch chamber for preparing silicon samples for transmission electron microscopy;Review of Scientific Instruments;1985-04

5. The Formation of Porous Silicon and its Applications to Dielectric Isolation;MRS Proceedings;1984

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