Confinement Phenomena in Buried Oxides of SIMOX Structures as Affected by Processing
Author:
Affiliation:
1. Department of Applied Physics, University of Erlangen‐Nürnberg, Erlangen, Germany
2. Revesz Associates, Bethesda, Maryland 20817
3. Naval Research Laboratory, Washington, DC 20375
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.1836503/pdf
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Comparative study of NSB and UTB SOI MOSFETs characteristics by extraction of series resistance;Solid-State Electronics;2014-01
2. Influence of Series Massive Resistance on Capacitance and Conductance Characteristics in Gate-Recessed Nanoscale SOI MOSFETs;Active and Passive Electronic Components;2013
3. Modeling of the Channel Thickness Influence on Electrical Characteristics and Series Resistance in Gate-Recessed Nanoscale SOI MOSFETs;Active and Passive Electronic Components;2013
4. Cathodoluminescence Microanalysis of the Defect Microstructures of Bulk and Nanoscale Ultrapure Silicon Dioxide Polymorphs for Device Applications;Springer Geology;2012
5. Cathodoluminescence microcharacterization of the radiation-sensitive defect microstructure ofin situburied oxide in silicon;Journal of Physics D: Applied Physics;2011-06-02
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3