The Application of Advanced Spectroscopic Diagnostics with Chemometric Modelling to Optimise Thin Film Properties Grown by Atmospheric Pressure PECVD

Abstract

This paper reports the use of a multiple technique approach to monitor the atmospheric pressure plasma-enhanced chemical vapour deposition (PECVD) of silica films on glass. In-line FT-IR spectroscopy and optical emission spectroscopy have been combined with electrical measurements to investigate the plasma during the deposition process. The experiments have been carried out as a chemometric design so as to derive statistical models linking the key input variables to the measured film properties. Initial results confirm the viability of this approach for improved process understanding, process control and enhanced design capabilities. Some comments have also been made on the chemistry of the process.